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M.T.O.

Ion Implantation into Silicon Wafers
Flash Animations

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Description

These Flash animations demonstrate how ions are implanted into silicon wafers during the manufacture of semi-conductors. Animations demonstrate implantation, channeling, annealing and masking.

Screen Capture

screen capture of channelling. Implanted red ions causes damage to the silicon atomic crystal structire (atomes are bumped out of position)

Related MTOs

See the Engineering/Physical Sciences MTO page for additional modules on enginnering.

Course Information

Original Course: EE 418 - Solid State Device Technology

Original Instructor: Jerzy Ruzyllo, Department of Electrical Engineering

Year: 2006

License and Download

This MTO item can be used royalty-free under the following conditions. See the MTO Item Open Source License for complete terms.

Download Link

The .swf Flash animation file and help documents are compressed in a .zip file. Once you download the file, double-click on the .zip file to extract the Files. Open the ReadMe.html file for instructions on posting the Flash file on a Web site or in a course management system.

Download Animation (ionimplant.zip - 1 M)

 

© 2005-2007 The Pennsylvania State University. Contact tltmto@psu.edu if you have any questions.
Last Update: January 19, 2007